EKLElse Kooi Laboratory

Contact details:

Casper Juffermans
Feldmannweg 17, 2628 CT Delft
+31 6 83540596

The Else Kooi Laboratory and its staff aim to provide microfabrication capabilities that facilitate excellence in (sub)micro-fabrication oriented Research & Science, enable customers to test concepts that may lead to business successes (up to and including small scale production) and build a bridge between Academics and Industrial Innovation. In terms of facilities, processes and expertise, the lab is superbly equipped for micro-manufacturing at the cutting edge of integrated circuits, micro-electromechanical systems, and working with flexible substrates. The combination of these technologies makes the lab unique. The lab is accessible to third parties, and flexible with respect to new materials.

Our cleanrooms and laboratories provides a fully equipped processing environment for a wide range of microstructures, complete ICs, and devices such as bipolar, CMOS, ThinFilmTransistors, Photovoltaic, MEMS, NEMS and Flexible Electronics. To facility research into new technologies, the labs are highly flexible with respect to new materials and processes. On the other hand, EKL strives for industry-compatibility so that new technologies may be transferred to industry smoothly.
With microfabrication being a broadly applicable key technology, the lab accommodates and facilitates many different types of research. Currently in EKL, research is executed in the fields of:
Quantum computing, Radiation detection, Optomechanics, Charged Particle Optics, Bionanotechnology, Nanoreactors, Organ-on-chip, Medical implants, Photovoltaic cells, Heterogeneous integration (packaging, system on chip) and Micro and Nano Engineering.
To support this research range EKL operates a wide range of equipment in EKL, including:
Lithographic equipment, including an ASML PAS5500 Wafer Stepper giving 300nm dimension capabilities. A large diversity of deposition equipment, including PECVD, LPCVD, metal Sputter Deposition, metal Evaporation, Graphene & CNT and polymer deposition. Plasma etching of these materials, including Deep Reactive Ion Etching for through wafer etching needed for MEMS and 3D integrated devices.
A large variation of wet cleaning and wet etching, including vapour etching for highs aspect ratio release of MEMS and NEMS structures. A large set of furnaces and ovens for thermal processes for silicon oxidation, metal annealing and oxidation. Unique in the Netherlands are the Epitaxy and ion-implantation equipment. They support the full active device manufacturing capability and are of great importance for the research in the field of quantum computing and radiation detection (electron and EUV detectors).
The complete set of devices processing equipment is complemented with an extensive set of metrology, measurement and characterization equipment that supports the device fabrication and control of the process with sub nanometer resolution.
The extensive equipment collection is relatively industry-compatible environment and fully compatible with a 100nm substrate size and for a significant part of the equipment compatible with 150mm substrate sizes. This substrate size range allows good interaction (like substrate exchange) between the industrial partners (PINS Eindhoven, ECN,..). This will support the transfer of the research results to industry.

Connection to strategic developments
Physical Sciences and Engineering